Terepure CMP Cartridges
Terepure CMP Series are designed for the filtration of alumina, ceria and silica slurry in chemical mechanical planarization (CMP). The special graded-density design provides excellent retention of agglomerates, which are disruptive to the CMP process, and release the desired slurry to the process.
Terepure CMP Series offer filtration solution across whole slurry dispenses processes.
Terepure CMP Series offer filtration solution across whole slurry dispenses processes.
Specifications
Medium: Polypropylene
Core ,cage and endcaps : Polypropylene
Support layer: Polypropylene
Removal Ratings: 0.05, 0.07, 0.1, 0.2, 0.3, 0.5, 1, 3, 5, 7, 9, 11µm
Diameter : 69mm (Outer diameter )
Length: 5”, 10”, 20”, 30”, 40”
Core ,cage and endcaps : Polypropylene
Support layer: Polypropylene
Removal Ratings: 0.05, 0.07, 0.1, 0.2, 0.3, 0.5, 1, 3, 5, 7, 9, 11µm
Diameter : 69mm (Outer diameter )
Length: 5”, 10”, 20”, 30”, 40”
Benefits & Features
Broad chemical resistance.
High flow rate.
Low pressure drop.
All PP materials (no binders or resins).
High contaminant holding capacity.
High flow rate.
Low pressure drop.
All PP materials (no binders or resins).
High contaminant holding capacity.
Application
CMP slurry.
Plating solution, Acids, Alkalis, Solvents, DI water Ink clarification.
Plating solution, Acids, Alkalis, Solvents, DI water Ink clarification.
